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Thermal evolution of hydrogen related defects in hydrogen implanted Czochralski silicon investigated by Raman spectroscopy and atomic force microscopy

Authors: Duengen, W., Job, R., Ma, Y., Huang, Y.L., Mueller, T., Fahrner, W.R., Keller, L.O., Horstmann, J.T. and Fiedler, H.

Journal: JOURNAL OF APPLIED PHYSICS

Volume: 100

Issue: 3

eISSN: 1089-7550

ISSN: 0021-8979

DOI: 10.1063/1.2227262

Source: Web of Science (Lite)